Quantum Dot and Nanowire Nanoelectronics, Paul R. Berger

Also see The OSU Nanoscale Patterning Laboratory

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Advisor: Paul R. Berger

Students:
Tyler Growden (ECE Ph.D. candidate)

Collaborators:
Phillip E. Thompson (Naval Research Laboratory)
Ilesanmi Adesida (University of Illinois at Urbana-Champaign)
Patrick J. Fay (University of Notre Dame)
Gregory L. Snider (University of Notre Dame)
Alexei O. Orlov (University of Notre Dame)
Roger Lake (University of California at Riverside)

Former Graduate Students:
Ms. Anisha Ramesh (ECE Ph.D. 2012)
Si-Young Park (Master's Thesis 2006, Ph.D. 2009)
Ronghua Yu (Physics Ph.D. 2007)
Sung-Yong Chung (Master's Thesis 2002, Ph.D. 2005)
Sandro Di Giacomo (Master's Thesis 2005)
Niu Jin (Ph.D. 2004)

Importance of the Problem:

Continued scaling of CMOS transistors is expected to reach diminishing returns in the years to come. More more background information, see:

Brief Description of Our Work and Results:

Under construction.

Awards and Citations

Patents

Publications

Nanowires

  1. "Fabrication of Nanowires with High Aspect Ratios Utilized by Dry Etching with SF6:C4F8 and Self-limiting Thermal Oxidation on Si Substrate," Si-Young Park, Sandro J. Di Giacomo, R. Anisha, Paul R. Berger, Phillip E. Thompson, and Ilesanmi Adesida, Journal of Vacuum Science and Technology B, 28, pp. 763-768 (July/August 2010). PDF (405 kB)

  2. "Synthesis, Characterization, and Electrical Properties of Individual Au-NiO-Au Heterojunction Nanowires," Jason S. Tresback, Alexander L. Vasiliev, Nitin P. Padture, Si-Young Park, and Paul R. Berger, IEEE Transactions on Nanotechnology, 6, pp. 676-681 (November 2007). PDF (1921 kB)

Nanopatterning Techniques

  1. "Nanometer-Period Gratings in Hydrogen Silsesquioxane Fabricated by Electron Beam Lithography," Michael J. Word, Ilesanmi Adesida, and Paul R. Berger, Rapid Communications in Journal of Vacuum Science and Technology B , 21 , pp. L12-L15 (November/December 2003). PDF (603 kB)

Conference Presentations

  1. "30-nm Period Gratings in Hydrogen Silsesquioxane Resist Fabricated by Electron-Beam Lithography," M. J. Word, P. Berger,and I. Adesida, 2003 Electronic Materials Conference (EMC) in Salt Lake City, UT (June 2003).

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Last updated April 27, 2013.


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